T-Hub, IFCCI sign MoU to fortify Indo-French tech ties
T-Hub signed a MoU with the IFCCI to reinforce the dialogue of innovation, growth and prosperity between India and France
T-Hub and IFCCI
HYDERABAD: T-Hub, on Friday, signed a memorandum of understanding (MoU) with the Indo-French Chamber of Commerce & Industry (IFCCI) to reinforce the dialogue of innovation, growth and prosperity between India and France. The MoU was signed in the presence of Telangana Minister for Municipal Administration and Urban Development KT Rama Rao and President and Founder of IFCCI, Sumeet Anand.
The one-year agreement is expected to act as a gateway for Indian and France-based technology-driven start-ups to scale globally and strengthen the robust innovation ecosystem in both countries. T-Hub and IFCCI are set to collaborate on events and workshops to promote Indo-French partnerships in the technology and innovation sectors to bridge the gap between the French and Indian start-up ecosystems.
CEO of T-Hub, Srinivas Rao Mahankali, on the occasion said, "Our partnership with IFCCI aims to address these challenges and opportunities that will help boost the continued growth of India-France bilateral relations. It also presents a chance for our start-ups to connect with France's innovation and start-up ecosystem and gain access to peers and industry experts."
IFCCI and Founder Sumeet Anand said, "IFCCI's new chapter in Hyderabad is to support growing French investments in Hyderabad given the strong support of the Govt of Telangana. This is driven by 3+1 attractive reasons: a market with scale, talent for India and the world, supply chain in increasing products and now sustainable solutions for the planet!"
IFCCI also launched its Hyderabad chapter at T-Hub's new facility. T-Hub and IFCCI also hosted a French business delegation that was brought by MEDEF International, which included CXOs of French and Indian companies, state officials, diplomats, policymakers, top players in the private sectors of France and India, multilateral organizations and renowned industry experts among others.